Purpose : Evaluate Plasma Charateristics of Compound
· Chamber : APPLIED MATERIALS MxP Etch Chamber
· Process Gas : NF3, O2, Cl2, H2, CF4, Ar, N2
· Dry Pump
Pumping Speed : 160 m3/h
· Turbo Pump
Rated speed : 48,000 RPM
Pumping speed for H2 : 220 l/s
Pumping speed for N2 : 300 l/s
Maximum Vacuum Pressure : 10-9 Torr
· RF Power Range : ~1,200W
Purpose : Evaluate Thermal Charateristics of Compound
(Thermal decomposition temperature, Thermal stability, etc.)
· Model : TGA 209 F1 Libra
· Maker :NETZSCH
· Specification
Temperature range : 10 ~ 1,100 ℃
Heating rate : 0.001 ~ 200 K/min
Cooling time : 12 min in Nitrogen(N2)
5 min in Helium(He)
Resolution : 1 ㎍ (=0.001 mg)
Furnance Materials : Ceramic
Purpose : Get an image of surface at high magnification
Analyze elements of surface
· Model : EM-30AXN
· Maker : COXEM, Bruker
· Specification of SEM
Resolution : 5 nm at 30 kV
Magnification : x 20 ~ x 150,000
Accelerating Voltage : 1 ~ 30 kV
Electron Gun : W(Tungsten) Filament
Image Mode : SE, BSE, SE+BSE Mixed image
· Specification of EDS
Resolution : 129 eV at 1,000,000 cps
Detectable Element : Be(3) ~ Cf(98)
Purpose : Evaluate Valve Perforamance
· Type : Rocker Valve (Horizontal motion)
Gate Slit Valve (Vertical motion)
· Dry Pump
Vacuum Pumping Speed : 37 m3/h
· Turbo Pump
Rated speed : 60,000 RPM
Pumping speed for He : 255 l/s
Pumping speed for N2 : 260 l/s
Maximum Vacuum Pressure : 10-6 Torr
Purpose : Evaluate Valve Perforamance
· Model : ASM-340
· Maker : PFEIFER VACUUM
· Specification
Vacuum pumping speed : 15 m3/h
Pumping speed for He : 2.5 l/s
Sensible gas : 4He, 3He, H2
Minimm detectable leakage rate for He : 3.75*10-12 Torr*l/s
Purpose : Evaluate Mechanical Properties of Compound
· Model : TO-101
· Maker : TEST ONE
· Specification
Max. Load capacity : 500 N
Vertical test space : 950 mm
Column type : Sigle Column
Load resolution : 1/50,000 N
Driving system : Ball Screw Type
Driving motor : Stepping Motor & Reducer
Test category : Tensile, Tear, Peel, Compression, Bending, Repeat etc.